AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns

15 March 2023

Papers citing "AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns"

5 / 5 papers shown

Title
Differentiable Edge-based OPC Guojin Chen Haoyu Yang Haoxing Ren Bei Yu David Z. Pan 25 0 0 16 Aug 2024
LLM-Enhanced Bayesian Optimization for Efficient Analog Layout Constraint Generation Guojin Chen Keren Zhu Seunggeun Kim Hanqing Zhu Yao Lai Bei Yu David Z. Pan 31 7 0 07 Jun 2024
ILILT: Implicit Learning of Inverse Lithography Technologies Haoyu Yang Haoxing Ren 39 3 0 06 May 2024
ChatPattern: Layout Pattern Customization via Natural Language Zixiao Wang Yunheng Shen Xufeng Yao Wenqian Zhao Yang Bai Farzan Farnia Bei Yu 21 5 0 15 Mar 2024
GPU-accelerated Matrix Cover Algorithm for Multiple Patterning Layout Decomposition Guojin Chen Haoyu Yang Bei Yu 16 3 0 25 Mar 2023